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Sintesis dan Karakterisasi Thin Film Silika dengan Penambahan Trimetilklorosilan (TMCS) dan AgNO₃ serta Uji Aktivitas Antibakteri
Research on the synthesis of silica thin films with variations in TMCS volume and
AgNO3 concentration has been conducted with the aim of determining the optimal
composition for the production of hydrophobic silica thin films with antibacterial
properties. Trimethylchlorosilane (TMCS) was chosen as the silanization agent
because it can react with Si–OH groups, forming Si-O-Si(CH3) to enhance
hydrophobicity. Silver nitrate (AgNO3) is known for its effective ability to kill
various types of bacteria by releasing Ag+ ions to deactivate microbial cells, thus
damaging the cell membrane. The research results were then characterized using
Water Contact Angle (WCA) measurements, FTIR, and antibacterial activity tests.
The optimal composition for obtaining hydrophobic thin films was found to be 3:6
(TEOS:TMCS) with the addition of AgNO3 variation at 0.04 M. This choice
resulted in the highest contact angles, measuring 103.26° and 118.71°, respectively.
The best hydrophobic thin films before and after calcination (T2, TC, K2, and KC)
exhibited a higher Si-O-Si area ratio compared to the Si-OH area ratio, indicating
their hydrophobic nature. Antibacterial activity tests on xerogel thin films with
varying concentrations of AgNO3 showed inhibition of the growth of S. aureus and
E. coli bacteria. The inhibition activity against S. aureus was greater than that
against E. coli.
Keywords: thin film, silica, sol-gel, hydrophobic, antibacterial
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